plasma source

TiN coating for inner surface modification by grid enhanced plasma source ion implantation

内表面栅极等离子体源离子注入TiN薄膜及其特性研究

The advance in inductively coupled plasma mass spectrometer ( ICP-MS) was reviewed from the views of sample infeed, plasma source, mass analyzer, ion detector and auxiliaries. The application of ICP-MS in tobacco analysis was also introduced.

从进样系统、离子源、质量分析器、离子检测器和辅助系统5个方面综述了电感耦合等离子体质谱（ICP-MS）仪器的进展，并简要介绍了ICP-MS在烟草元素分析中的应用。

Discharge Characteristics of Slot Antenna Plasma Source in Broad Pressure Range

宽气压范围内裂缝天线等离子体特性研究

With these advantages, Microwave ECR plasma finds number of applications in the areas of etching technologies, thin film deposition and plasma source.

建立了ECR微波等离子体源离子输运的平板和圆柱模型，对离子历经的空间区域的输运过程进行了数值研究。

ZrN thin films were prepared on 45 # steel by using ECR-microwave plasma source enhanced deposition.

利用ECR - 微波等离子溅射沉积技术不同偏压下在45 # 钢基体上制备了ZrN薄膜.

In order to study the atomization and excitation mechanism of the inductively coupled plasma source, the excitation temperature and electron density of the sources were determined in the different conditions of the putout energy.

为了探讨电感耦合等离子体光源的原子化和激发机理，测定了不同激光输出能量条件下光源的激发温度和电子密度。

Due to the sample being introduced as an aerosol through the innermost concentric tube of the plasma source at a frequency of about 27 MHz, the skin effect occurs.

由于样品以气溶胶的形式通过最中间同心管引入频率为27MHz的等离子光源，出现趋肤效应。

Atmospheric pressure non-thermal plasma source and its application in textile processing

常压非热等离子体源及其在纺织整理中的应用

Development of a radio-frequency ion trap mass spectrometer with external laser plasma source

激光离子源射频离子阱质谱计的研制

Filtered Cathodic Arc Plasma Source and Thin Film Deposition

磁过滤的阴极弧等离子体源及其薄膜制备

The linear ECR microwave plasma source is consist of microwave source, coaxial line waveguide, grounded grid electrode and magnetic field coil outside the vacuum chamber.

线性ECR微波等离子体源由微波源、同轴线波导、接地栅网电极和真空室外磁场线圈构成。

Numerical simulation of collisional sheath evolution in plasma source ion implantation

等离子体源离子注入鞘层时空演化的研究

Optical thin film properties deposited using the adapted high ion current plasma source are likewise described.

最后描述了利用高离子电流密度等离子体镀膜的光学薄膜。

A low argon nebulizing system for direct current plasma source

直流等离子体光源的一种低氩雾化系统